ISA 200
The ISA 200 is a procedural plant for inert gas ion beam etching as well as for reactive ion beam etching. Backside cooling, workpiece heating, interface for a clean room, beam monitoring via Faraday cup array and other useful features are available for this plant. A second ion source can be attached to combine the etching process with an ion beam assisted coating process via 4 sputter targets.
Further informations can be downloaded here:
